| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce or remove the risk of focusing defects, and to maintain or increase throughput. <P>SOLUTION: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the handling structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps. <P>COPYRIGHT: (C)2011,JPO&INPIT |
