| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a data processing technology for eliminating unevenness that a pattern on a photomask has in electron beam exposure. <P>SOLUTION: Drawing data are sectioned into meshes of arbitrary sizes. Then, random numbers are generated as resizing amounts for the data sectioned in the meshes. After it is confirmed that an arrangement of the random numbers has no problem, the sectioned data are resized with the allocated resizing amounts and data smashing is carried out again. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
