| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical amplification resist composition to be used for the preparation of a mold, capable of forming a pattern excellent not only in sensitivity and resolution, but also in the line width roughness (LWR) performance, in preparation of a mold. <P>SOLUTION: The chemical amplification resist composition contains a resin which is decomposed by an action of a specified acid to increase the solubility with an alkali developing solution, and a mold preparation method and a resist film each using the composition are also disclosed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
