| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic apparatus. <P>SOLUTION: A cleaning tool to clean a surface of a component of the lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. <P>COPYRIGHT: (C)2011,JPO&INPIT |
