| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine pattern measuring method which accurately measures a sidewall angle of a fine pattern from an image obtained by a scanning electron microscope. <P>SOLUTION: The fine pattern measuring method includes: generating a signal profile from a scan image obtained by scanning the fine pattern with an electron beam; and extracting a luminance value corresponding to a pattern flat part in the fine pattern from the signal profile. A luminance value of each pixel of the scan image results from normalization processing at a compression based on a maximum luminance value in the image. Accordingly, the luminance value of the pattern flat part depends on the sidewall angle of the fine pattern. Therefore, the luminance value is used as an index value of the sidewall angle to calculate the sidewall angle of the fine pattern, whereby even a steep sidewall angle corresponding to a width narrower than a beam diameter of the scanning electron microscope is accurately measured. <P>COPYRIGHT: (C)2011,JPO&INPIT |
