DEVICE AND METHOD OF INSPECTING CIRCUIT PATTERN

摘要

PROBLEM TO BE SOLVED: To efficiently monitor a frequency of defect generation and characteristic likelihood of an ROI region with high sensitivity. SOLUTION: A plurality of electron beams arranged in matrix are applied on a circuit pattern while thinning in a stage movement direction in synchronization with continuous movement of a stage. Generated secondary electrons or the like are obtained, and images acquired in a same region are averaged to acquire an image of a high S/N rapidly to determine defect of the circuit pattern from the acquired image. By acquiring the image not in an adjacent region but by thinning in moving in a direction vertical to stage movement, the frequency of defect generation and characteristic likelihood of only the ROI region or the entire circuit pattern can be efficiently monitored. COPYRIGHT: (C)2011,JPO&INPIT