发明名称 HETEROJUNCTION FIELD-EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a heterojunction field-effect transistor in which a leakage current is small and a breakdown strength is high. SOLUTION: The heterojunction field-effect transistor includes: an AlN buffer layer; an AlGaN composition inclined layer; a GaN channel layer; and an AlGaN barrier layer, which are successively layered on an insulating substrate. The AlGaN composition inclined layer reduces an Al density from the lower face toward the upper face, the AlGaN barrier layer has a larger Al density by 15% or more than the Al density on the upper face of the AlGaN composition inclined layer, and a pseudo p-type sheet carrier density obtained by spontaneous polarization and a piezoelectric effect in the AlGaN composition inclined layer is 3×10<SP>12</SP>cm<SP>-2</SP>through 4×10<SP>12</SP>cm<SP>-2</SP>. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011187643(A) 申请公布日期 2011.09.22
申请号 JP20100050712 申请日期 2010.03.08
申请人 SHARP CORP 发明人 TERAGUCHI NOBUAKI;JON TOWAINAMU;FUJII YOSHIHISA
分类号 H01L21/338;H01L21/28;H01L29/778;H01L29/812 主分类号 H01L21/338
代理机构 代理人
主权项
地址