发明名称 |
METHOD FOR PRODUCING CRYSTALLINE SILICON-CONTAINING OXIDE HAVING MICROPORE AND MESO/MACROPORE |
摘要 |
PROBLEM TO BE SOLVED: To provide a new production technique for a material having both a crystalline silicon-containing oxide structure and a meso/macroporous structure. SOLUTION: The method for producing a crystalline silicon-containing oxide having micropores and meso/macropores is provided including: a step 1 of forming a silicon-containing oxide-epoxy resin composite by reacting a mixture containing an epoxy resin, a silicon alkoxide and an acid anhydride; a step 2 of crystallizing a silicon-containing oxide by hydrothermally treating the resulting composite under alkaline conditions; and a step 3 of removing an organic component from a crystalline silicon-containing oxide-epoxy resin composite obtained in the step 2. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011184281(A) |
申请公布日期 |
2011.09.22 |
申请号 |
JP20100054766 |
申请日期 |
2010.03.11 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE& TECHNOLOGY |
发明人 |
FUJIWARA MASAHIRO;SAKAMOTO TETSURITSU |
分类号 |
C01B37/02;C01B37/00;C01B39/04 |
主分类号 |
C01B37/02 |
代理机构 |
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