发明名称 |
INSPECTION FOR LITHOGRAPHY |
摘要 |
<p>A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. The grating and the initial linear polarization of said radiation beam are angled non-orthogonally relative to each other.</p> |
申请公布号 |
WO2011113663(A1) |
申请公布日期 |
2011.09.22 |
申请号 |
WO2011EP52491 |
申请日期 |
2011.02.21 |
申请人 |
ASML NETHERLANDS B.V.;STRAAIJER, ALEXANDER |
发明人 |
STRAAIJER, ALEXANDER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|