| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD device capable of uniformly forming the entire surface of a film formed on a substrate surface. SOLUTION: In the thermal CVD device for forming a carbon nano tube having a heating chamber 13 for forming the carbon nano tube on the surface of a substrate K by a thermal chemical vapor deposition method, a guide plate 23 holding the substrate K moved in a prescribed direction in the heating chamber 13 and having a prescribed width so as to give the side surface view thereof to an arc shape is provided and a discharge outlet 5 of a raw material gas G is disposed along the width direction of the substrate K in a center position of the arc of the substrate K held by the guide plate 23. COPYRIGHT: (C)2011,JPO&INPIT
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