MASK BLANK AND PHOTOMASK

摘要

A mask blank and a photomask are provided to form a proper and adaptive structure by improving a composition thereof. A light shielding layer(12) is formed on a light transmitting substrate(10). A mask blank for manufacturing an FPD device is used for forming a laser drawing resist layer on the light shielding layer. The light shielding layer is formed with a controlled layer so that a reflectance of a layer surface to a laser drawing wavelength is equal to and less than 15 percent. The laser drawing wavelength is a wavelength which is selected from a wavelength range of 350nm to 500nm. The light shielding layer includes an anti-reflective layer and a crystalline control layer for controlling crystallinity of the anti-reflective layer.