发明名称 Method of carrying out an exposure process for a liquid crystal display device
摘要 An apparatus for manufacturing a liquid crystal display device is disclosed. A first robot arm at a loading side of the thru-conveyor receives a substrate coated with photoresist and conveys the substrate to a thru-conveyor. A softbake hot plate (SHP) at the unloading side of the thru-conveyor removes solvent from the substrate. A cool plate lowers the substrate temperature from which the solvent is removed. A buffer temporarily stores the substrate having the lowered temperature. A second robot arm between the thru-conveyor, the SHP, the cool plate and a loading side of the buffer, loads/unloads the substrate. A temperature control unit adjusts the substrate temperature unloaded from the buffer. A third robot arm between the unloading side of the buffer, the temperature control unit and an exposure unit that exposes the substrate, loads/unloads the substrate.
申请公布号 US8021993(B2) 申请公布日期 2011.09.20
申请号 US20050315063 申请日期 2005.12.22
申请人 LG DISPLAY CO., LTD. 发明人 KIM YONG HUN;KWAK SANG MIN;SEO JIN WOO
分类号 H01L21/00 主分类号 H01L21/00
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