发明名称 |
Apparatus And Method Utilizing A Double Glow Discharge Plasma For Sputter Cleaning |
摘要 |
The present disclosure relates to an apparatus and method utilizing double glow discharge for sputter cleaning of a selected surface. The surface may include the inner surface of a hollow substrate such as a tube which inner surface may then be coated via magnetron sputter deposition.
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申请公布号 |
US2011220490(A1) |
申请公布日期 |
2011.09.15 |
申请号 |
US20100723816 |
申请日期 |
2010.03.15 |
申请人 |
SOUTHWEST RESEARCH INSTITUTE |
发明人 |
WEI RONGHUA;LANGA EDWARD;LEE SABRINA L. |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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