ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET

摘要

A rotatable target (100) for a sputtering installation (200) and a method for producing a rotatable target (100) are provided. The target (100) includes a backing tube (10) to which a target tube (20) is shrink-fitted. The method includes setting a positive temperature difference between a target tube (20) and a backing tube (10). The method further includes pulling the target tube (20) over the backing tube (10) while the temperature difference remains positive. Furthermore, a backing tube (10) having a middle part (110) with an outer lateral area (12a) and a notch (15) extending in a longitudinal direction on the outer lateral area (12a) is provided.