发明名称 TWO-DIMENSIONAL X-RAY DETECTOR ARRAY INSPECTION METHOD
摘要 <p>Disclosed is a two-dimensional X-ray detector array inspection method capable of recognizing two-dimensional X-ray detector arrays unsuitable for X-ray imaging by means of identifying quickly growing defective pixels. The two-dimensional X-ray detector array inspection method involves a bias voltage step for repeated application and stopping of a bias voltage from a common electrode; a dark current value measurement step for measuring the pixel values of pixels in a non-X-ray-irradiating state; a defective pixel identification step for identifying defective pixels on the basis of the pixel values of the pixels measured in the dark current value measurement step; and a determination step for determining whether or not the two-dimensional X-ray array detector is suitable on the basis of the size of the missing pixel chunks or the total number of defective pixels identified in the defective pixel identification step.</p>
申请公布号 WO2011111590(A1) 申请公布日期 2011.09.15
申请号 WO2011JP54848 申请日期 2011.03.03
申请人 SHIMADZU CORPORATION;SATO KENJI 发明人 SATO KENJI
分类号 G01T1/24;A61B6/00 主分类号 G01T1/24
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