发明名称 NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME
摘要 A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
申请公布号 US2011223279(A1) 申请公布日期 2011.09.15
申请号 US201113113534 申请日期 2011.05.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HAE-SUNG;KO HYOUNG-SOO;HONG SEUNG-BUM;SOHN JIN-SEUNG;CHOA SUNG-HOON;LIM CHEE-KHENG
分类号 B29C59/02 主分类号 B29C59/02
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