METHODS AND COMPOSITIONS FOR DOPING SILICON SUBSTRATES WITH MOLECULAR MONOLAYERS
摘要
Compositions and methods for doping silicon substrates by treating the substrate with a diluted dopant solution comprising tetraethylene glycol dimethyl ether (tetraglyme) and a dopant-containing material and subsequently diffusing the dopant into the surface by rapid thermal annealing. Diethyl-1 -propylphosphonate and allylboronic acid pinacol ester are preferred dopant-containing materials, and are preferably included in the diluted dopant solution in an amount ranging from about 1 % to about 20%, with a dopant amount of 4% or less being more preferred.
申请公布号
WO2011112546(A1)
申请公布日期
2011.09.15
申请号
WO2011US27493
申请日期
2011.03.08
申请人
DYNALOY, LLC;POLLARD, KIMBERLY, DONA;RECTOR, ALLISON, C.