| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which is excellent in storage stability and has good lithography properties, to provide a method for forming a resist pattern using the resist composition, and to provide a nitrogen-containing organic compound useful as a nitrogen-containing organic compound component contained in the resist composition. <P>SOLUTION: The resist composition contains: a base material component (A) whose solubility to an alkali developing solution is changed by the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a nitrogen-containing organic compound component (D) represented by general formula (d1). In the general formula (d1), R<SP>1</SP>each independently represent hydrogen atom or straight chain, branched chain or cyclic alkyl group or aryl group which may have a substituent, R<SP>2</SP>each independently represent hydrogen atom or 1-5C alkyl group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
