| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce the solvent concentration of a gas discharged from a gas-liquid separator. <P>SOLUTION: A substrate processing apparatus includes an exhaust pipe 69 which has one end side connected inside a chamber 27 and discharges a gas from the inside of the chamber 27, a drain pipe 63 which has one end side connected inside the chamber 27 and discharges a processing liquid from the inside of the chamber 27, and the gas-liquid separation part 61 to which the other end side of the exhaust pipe 69 is connected so as to take in the gas discharged from the chamber 27 and to which the other end side of the drain pipe 63 is connected to take in the processing liquid discharged through the drain pipe 63, and which separates the gas and liquid. A nozzle 81 is moved up and down in the gas-liquid separation part 61 to supply pure water to the entire surface of a first wire net 77, and isopropyl alcohol in a state of vapor is dissolved in droplets of the pure water to be discharged as a liquid. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
