发明名称 TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 According to an embodiment of the present invention, a transistor includes a source electrode, a drain electrode, a graphene film formed between the source electrode and the drain electrode and having a first region and a second region, and a gate electrode formed on the first region and the second region of the graphene film via a gate insulating film. The graphene film functions as a channel. A Schottky junction is formed at a junction between the first region and the second region. The first region has a conductor property, and the second region is adjacent to the drain electrode side of the first region and has a semiconductor property.
申请公布号 US2011220865(A1) 申请公布日期 2011.09.15
申请号 US201113044727 申请日期 2011.03.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MIYATA TOSHITAKA;ADACHI KANNA;KAWANAKA SHIGERU;NAKAHARAI SHU
分类号 H01L29/66;B82Y99/00 主分类号 H01L29/66
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