发明名称 |
METHOD AND DEVICE FOR PLASMA-TREATING WORKPIECES |
摘要 |
The method and device are used to plasma-treat workpieces. The workpiece is inserted into a chamber of a treatment station that can be at least partially evacuated. The plasma chamber is bounded by a chamber bottom, a chamber cover, and a lateral chamber wall. The method process is optically monitored at least at times. In the optical monitoring, spectral lines of the radiation of the plasma above 500 nanometers are evaluated. Preferably, the evaluation is performed for frequencies above 700 nanometers. |
申请公布号 |
WO2011110162(A1) |
申请公布日期 |
2011.09.15 |
申请号 |
WO2011DE00234 |
申请日期 |
2011.03.03 |
申请人 |
KHS CORPOPLAST GMBH & CO KG;SIEBELS, SOENKE;KYTZIA, SEBASTIAN |
发明人 |
SIEBELS, SOENKE;KYTZIA, SEBASTIAN |
分类号 |
C23C16/04;C23C16/511;C23C16/52;G01J3/443;H01J37/32 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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