发明名称 METHOD AND APPARATUS FOR VISUALLY INSPECTING THICKNESS OF SILICON FILM OF SOI WAFER
摘要 PROBLEM TO BE SOLVED: To achieve a method for visually inspecting the thickness of a silicon film of an SOI wafer. SOLUTION: The thickness of the silicon film is inspected by visually observing interference fringes of reflection light 7, 8 reflected by the SOI wafer 1 when visible light 2 including a wavelength near the wavelength of infra-red light and emitted from a light source, is radiated on the surface 4 of the SOI wafer 1 at an angle. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011181688(A) 申请公布日期 2011.09.15
申请号 JP20100044525 申请日期 2010.03.01
申请人 SUMCO CORP 发明人 TSUTSUMI MASAHIDE
分类号 H01L21/66;H01L27/12 主分类号 H01L21/66
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