发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD
摘要 Disclosed is a vapor deposition mask for patterning a thin film (3) on a substrate (10) by vapor deposition of vapor deposition particles through a plurality of stripe-shaped openings (K). The vapor deposition mask comprises a frame (65), a plurality of mask layers (70) provided so as to be superimposed on each other within that frame and support layers (71) provided between these mask layers (70). The mask layers (70) are formed by stretching a plurality of mask wires (72) to form a striped shape, and the support layers (71) are formed by stretching a plurality of support wires (74) that cross the mask wires (72). A plurality of through-spaces (73a) is formed so as to pass through all of the plurality of mask layers (70) linearly by superimposing a plurality of spaces (73) in each of the plurality of mask layers (70), and the openings (K) are formed by these through-spaces (73a).
申请公布号 WO2011111134(A1) 申请公布日期 2011.09.15
申请号 WO2010JP06416 申请日期 2010.10.29
申请人 SHARP KABUSHIKI KAISHA;SONODA, TOHRU;HAYASHI, NOBUHIRO;KAWATO, SHINICHI 发明人 SONODA, TOHRU;HAYASHI, NOBUHIRO;KAWATO, SHINICHI
分类号 C23C14/04;C23C14/24;C23C14/56;H01L51/50;H05B33/10 主分类号 C23C14/04
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