发明名称 |
TARGET FOR USE IN ULTRAVIOLET GENERATION, AND ELECTRON BEAM EXCITATION ULTRAVIOLET LIGHT SOURCE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide such a target for use in ultraviolet generation as can improve the ultraviolet generation efficiency, and to provide an electron beam excitation ultraviolet light source. <P>SOLUTION: The target 10 for use in ultraviolet generation includes a light-emitting layer 3 that generates ultraviolet light UV on receiving an electron beam EB. The light-emitting layer 3 contains Al, Ga, and N in the composition, and is doped with an impurity such as Si or the like, and has a carrier density of preferably from 6×10<SP>16</SP>(cm<SP>-3</SP>) to 2×10<SP>18</SP>(cm<SP>-3</SP>). <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
申请公布号 |
JP2011178928(A) |
申请公布日期 |
2011.09.15 |
申请号 |
JP20100045741 |
申请日期 |
2010.03.02 |
申请人 |
MIE UNIV;HAMAMATSU PHOTONICS KK |
发明人 |
MIYAKE HIDETO;HIRAMATSU KAZUMASA;SHIMABARA YUKI;TAKETOMI HIROYUKI;FUKUYO FUMITSUGU;OKADA TOMOYUKI;TAKAOKA HIDEJI;YOSHIDA HARUMASA |
分类号 |
C09K11/64;H01J63/04;H01J63/06 |
主分类号 |
C09K11/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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