发明名称 SEMICONDUCTOR LASER, SEMICONDUCTOR LASER DEVICE, AND FABRICATION METHOD OF SEMICONDUCTOR LASER
摘要 A semiconductor laser that includes: a substrate; a first semiconductor multilayer reflector of a first conductive type formed on the substrate; an active region formed on the first semiconductor multilayer reflector; a second semiconductor multilayer reflector of a second conductive type formed on the active region; and an intermediate semiconductor layer of a first conductive type or a second conductive type formed under the first semiconductor multilayer reflector or above the second semiconductor multilayer reflector. An oxidized region formed by oxidizing a part of the intermediate semiconductor layer and an un-oxidized region contacting with the oxidized region are formed in the intermediate semiconductor layer, the un-oxidized region is electrically connected to the first or second semiconductor multilayer reflector, and a beam generated in the active region is reflected at a boundary between the oxidized region and the un-oxidized region to a direction parallel to a principal surface of the substrate, and is emitted from a side surface of the intermediate semiconductor layer.
申请公布号 US2011222569(A1) 申请公布日期 2011.09.15
申请号 US20100879541 申请日期 2010.09.10
申请人 FUJI XEROX CO., LTD. 发明人 TAKEDA KAZUTAKA;KONDO TAKASHI;OZAWA HIDEAKI
分类号 H01S5/028;H01L33/46 主分类号 H01S5/028
代理机构 代理人
主权项
地址