PHOTOSENSITIVE RESIN COMPOSITION, THIN FILM THEREOF AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition which has high photoreactivity, can be patterned and can form a film with high hydrophobicity and excellent dielectric properties; a thin film of the composition; and a pattern forming method.

SOLUTION: The photosensitive resin composition comprising a block copolymer and a photoacid generator, the block copolymer having a block containing a cationic polymerizable group (a polymer block of an epoxy group-containing vinyl monomer) and a polysilane block, is applied to a substrate, and a formed coating film is selectively exposed to actinic rays and developed to thereby form a film pattern (a protective film or an insulating film) with high hydrophobicity and excellent dielectric properties through photocationic polymerization of the cationic polymerizable group and photocleavage of the polysilane block. The film is useful to form a thin film transistor using an organic semiconductor layer.

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