| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target that hardly causes arcing during sputtering. <P>SOLUTION: The sputtering target comprises a zinc oxide sintered body, wherein a crystalline orientation degree I<SB>002</SB>/(I<SB>002</SB>+I<SB>110</SB>) calculated by peak intensities in the X-ray diffraction measurement on the major face 11a to be exposed to a sputtering atmosphere, is 0.2 to <0.58. The zinc oxide sintered body is prepared by calcining a cast compact, and the cast compact is prepared by casting a slurry having a dispersion of the raw material powder into a casting die having a bottom formed of a water-absorbing material and a side wall formed of a material having no water absorptivity, and depositing the raw material powder while absorbing water by the water-absorbing material. <P>COPYRIGHT: (C)2011,JPO&INPIT |
