| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To increase the number and density of primary electron beamlet spots formed at a time while maintaining a desired image forming resolution of an electron microscope device. <P>SOLUTION: A particle optical device includes a charged particle source, and a porous plate arranged in a beam passage. The porous plate has a plurality of openings formed in a first prescribed array pattern, a plurality of charged particle beamlets are formed from a charged particle beam in the downstream, and by the plurality of the beamlets, a plurality of beamlet spots arranged in a second prescribed array pattern are formed on an image plane of the particle optical device. The particle optical device further includes particle optical elements in order to operate the charged particle beam and/or the plurality of the beamlets. The first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity, which is higher than the first pattern regularity in a second direction electron-optically corresponding to the first direction. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
