| 摘要 |
PROBLEM TO BE SOLVED: To provide a mist etching apparatus and a mist etching method which can also be applied even to a material to which etching processing is difficult and can obtain an excellent pattern shape in which side etching is suppressed and an etching processing surface is smooth. SOLUTION: The present invention relates to a mist etching apparatus including a mist generating unit for atomizing an etchant and an etching unit for etching an etching target. The mist etching apparatus is characterized in that the mist generating unit is comprised of a mist generating container in which the etchant is accommodated and atomized, a mist generating mechanism for atomizing the etchant, and a mist discharging port for discharging the generated mist to the outside of the mist generating container, the etching unit includes a mist introducing port through which the mist is introduced, and the etching target and the mist is vaporized in the etching unit. COPYRIGHT: (C)2011,JPO&INPIT |
