发明名称 |
ENHANCED MAGNETIC PLATING METHOD |
摘要 |
An apparatus for plating a magnetic film on a substrate includes: a track including a plurality of stopping points along the track; a permanent magnet placed on the track such that the permanent magnet can be moved along the track towards and away from the stopping points; at least one plating tank positioned on the stopping point; and a removable high permeability iron flux concentrator inserted into gaps between the substrate and inside walls of the plating tank, substantially surrounding the substrate and extending around and under the substrate.
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申请公布号 |
US2011220020(A1) |
申请公布日期 |
2011.09.15 |
申请号 |
US201113112477 |
申请日期 |
2011.05.20 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FLOTA MATTEO;ROMANKIW LUBOMYR TARAS;SHAO XIAOYAN;STEEN STEVEN ERIK;WEBB BUCKNELL CHAPMAN |
分类号 |
B05C9/04 |
主分类号 |
B05C9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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