| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can form a pattern having an excellent resolution and line edge roughness. <P>SOLUTION: The resin composition contains resin and an acid generation agent where the resin includes a structural unit derived from a monomer expressed by a formula (I) and at least one kind of a structural unit selected from a group composed of a structural unit derived from a monomer having a hydroxyl group and a structural unit derived from a monomer having a lactone ring. In the formula (I), R<SP>1</SP>represents a hydrogen atom, a halogen atom, or an 1-6C alkyl group which may have halogen atoms; R<SP>2</SP>and R<SP>3</SP>represent a hydrogen atom or a 1-6C alkyl group; and R<SP>4</SP>represents a 6-14C aryl group or a 7-15C aralkyl group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
