发明名称 PLATE-MAKING METHOD OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plate-making method of a lithographic printing plate having a photopolymerizable photosensitive layer on an aluminum support, by which the lithographic printing plate having a sufficient developing property and excellent printing resistance and stain resistance is obtained even when plate making is performed by using a developing solution having a low pH for environmental or safety reason. <P>SOLUTION: In the plate-making method of the lithographic printing plate, after exposing the lithographic printing plate having the photopolymerizable photosensitive layer containing at least a monomer having an ethylenic double bond at the side chain and carboxyl group on the aluminum support, the lithographic printing plate is subjected to developing treatment by using a developing solution substantially free from a water-soluble high molecular compound and having a pH of 5-9, and thereafter, a plate surface is treated with a plate surface protection agent containing at least a water-soluble high molecular compound and a phosphoric acid compound without being subjected to water-cleaning treatment. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011180197(A) 申请公布日期 2011.09.15
申请号 JP20100041671 申请日期 2010.02.26
申请人 MITSUBISHI PAPER MILLS LTD 发明人 ISHIKURA HIROYUKI
分类号 G03F7/40;G03F7/00;G03F7/027;G03F7/32 主分类号 G03F7/40
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