| 发明名称 |
METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS |
| 摘要 |
<p>Provided are methods of forming photolithographic patterns using a negative tone development process. Also provided are coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.</p> |
| 申请公布号 |
KR20110101098(A) |
申请公布日期 |
2011.09.15 |
| 申请号 |
KR20110019843 |
申请日期 |
2011.03.07 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
KANG, SEOK HO;CUTLER CHARLOTTE |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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