| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an optical condition setting method of a charged particle beam device which allows the setting of the optical condition to suppress the reduction of measurement and inspection accuracy due to the influence of an electrical charge, even when there exist many measurement points and inspection points, and also to provide the charged particle beam device. <P>SOLUTION: Proposed is a scanning electron microscope or the optical condition setting method for measuring a pattern on a sample, on the basis of the detection of electrons emitted from the sample by scanning the sample surface by an electron beam. In the scanning electron microscope or the optical condition setting method, changes in the measurement value with respect to the number of measurements is found from measurement values at a plurality of measurement points on the sample, and the sample surface electric field is controlled so that the inclination of the change is, or approaches zero. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
