<p>A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.</p>
申请公布号
WO2011090579(A3)
申请公布日期
2011.09.15
申请号
WO2010US59418
申请日期
2010.12.08
申请人
INTEL CORPORATION;OLSON, BENNETT;LAU, MAX;MA, CHENG-HSIN;MA, JIAN;JAMIESON, ANDREW, T.
发明人
OLSON, BENNETT;LAU, MAX;MA, CHENG-HSIN;MA, JIAN;JAMIESON, ANDREW, T.
