发明名称 |
Rotatable target, backing tube, sputtering installation and method for producing a rotatable target |
摘要 |
A rotatable target (100) for a sputtering installation (200) and a method for producing a rotatable target (100) are provided. The target (100) includes a backing tube (10) to which a target tube (20) is shrink-fitted. The method includes setting a positive temperature difference between a target tube (20) and a backing tube (10). The method further includes pulling the target tube (20) over the backing tube (10) while the temperature difference remains positive. Furthermore, a backing tube (10) having a middle part (110) with an outer lateral area (12a) and a notch (15) extending in a longitudinal direction on the outer lateral area (12a) is provided.
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申请公布号 |
EP2365515(A1) |
申请公布日期 |
2011.09.14 |
申请号 |
EP20100155977 |
申请日期 |
2010.03.09 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LIPPERT, LOTHAR;BUSCHBECK, WOLFGANG |
分类号 |
H01J37/34;C23C14/34 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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