发明名称 NANOSCALE InP FET
摘要 <p>A transistor device is formed of a continuous linear nanostructure having a source region, a drain region and a channel region between the source and drain regions. The source (20) and drain (26) regions are formed of nanowire ania the channel region (24) is in the form of a nanotube. An insulated gate (32) is provided adjacent to the channel region (24) for controlling conduction i ni the channel region between the source and drain regions.</p>
申请公布号 EP1771888(B1) 申请公布日期 2011.09.14
申请号 EP20050759916 申请日期 2005.07.12
申请人 NXP B.V. 发明人 SURDEANU, RADU;AGARWAL, PRABHAT;BALKENENDE, ABRAHAM RUDOLF;BAKKERS, ERIK, P., A., M.
分类号 H01L29/06;B82B3/00;H01L21/336;H01L29/20;H01L29/76;H01L29/775;H01L29/78 主分类号 H01L29/06
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