WAFER LIFT ROTATING MECHANISM, STAGE DEVICE AND ION IMPLANTATION DEVICE

摘要

PROBLEM TO BE SOLVED: To adjust a twist angle of a wafer mounted on an electrostatic chuck with simple constitution as well as attach and detach the wafer to and from the electrostatic chuck, and to adjust the twist angle of the wafer without rotating the electrostatic chuck. SOLUTION: A wafer lift rotating mechanism includes: a lift member 41 which comes into contact with a peripheral end Wa of the wafer W extending out of the electrostatic chuck 21 to mount or attach and detach the wafer W; an elevation mechanism 43 which elevates and lowers the lift member 41 in a perpendicular direction between a standby position P where the electrostatic chuck plate 21 is not in contact with the wafer W while mounted with the wafer W and an away position Q where the wafer W is held and spaced apart from an electrostatic chuck plate 21; and a rotating mechanism 42 which adjusts the twist angleβof the wafer W by rotating the lift member 41 in the state wherein the lift member 41 is at the away position Q where the wafer W is held. COPYRIGHT: (C)2011,JPO&INPIT