发明名称 PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS
摘要 <p>Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D): (A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) wherein wherein (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.</p>
申请公布号 EP2364847(A1) 申请公布日期 2011.09.14
申请号 EP20100252117 申请日期 2010.12.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 ASAI. SATOSHI;TAKEDA, TAKANOBU;KATO, HIDETO
分类号 B32B27/28;C08G77/52;C08J5/18;C08J7/04;C09D183/04 主分类号 B32B27/28
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