发明名称 |
PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS |
摘要 |
<p>Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D):
(A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1)
wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3)
wherein
wherein
(B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule;
(C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and
(D) a solvent.</p> |
申请公布号 |
EP2364847(A1) |
申请公布日期 |
2011.09.14 |
申请号 |
EP20100252117 |
申请日期 |
2010.12.15 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
ASAI. SATOSHI;TAKEDA, TAKANOBU;KATO, HIDETO |
分类号 |
B32B27/28;C08G77/52;C08J5/18;C08J7/04;C09D183/04 |
主分类号 |
B32B27/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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