| 摘要 |
Methods and devices are provided for fabricating waveguides. Some such methods comprise pressing outlines of waveguide features into a first layer; sputtering a second layer on the first layer, the second layer having a higher index of refraction than the layer the second layer is sputtered on; and forming a third layer on the second layer, the third layer having a lower index of refraction than the second layer. Further, a corresponding system for forming waveguides is disclosed, the system comprising: means for pressing outlines of waveguide features into a first layer; means for sputtering a second layer on the first layer, the second layer having a higher index of refraction than the layer the second layer is sputtered on; and means for forming a third layer on the second layer, the third layer having a lower index of refraction than the second layer.
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