发明名称 Buried conductor for imagers
摘要 A pixel cell having a photo-conversion device at a surface of a substrate and at least one contact area from which charge or a signal is output or received. A first insulating layer is located over the photo-conversion device and the at least one contact area. The pixel cell further includes at least one conductor in contact with the at least one contact area. The conductor includes a polysilicon material extending through the first insulating layer and in contact with the at least one contact area. Further, a conductive material, which includes at least one of a silicide and a refractory metal, can be over and in contact with the polysilicon material.
申请公布号 US8018015(B2) 申请公布日期 2011.09.13
申请号 US20050168760 申请日期 2005.06.29
申请人 MICRON TECHNOLOGY, INC. 发明人 RHODES HOWARD E.
分类号 H01L27/146;H01L31/00;H01L31/062;H01L31/113 主分类号 H01L27/146
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