| 摘要 |
A method of controlling a result parameter of an IC manufacturing procedure is described. The value of at least one first variable of a process correlated with the result parameter is acquired, and the difference between the predicted value and the target value of the result parameter is calculated from the same using a correlation equation of the first variable and the result parameter. A correcting action is then performed to a subsequent process including at least one second variable correlated with the result parameter, which is based on a correlation equation of the second variable and the result parameter to control the subsequent process and adjust the second variable such that the difference is reduced due to the affect of the second variable to the result parameter. The at least one first variable and the at least one second variable include two or more different physical quantities.
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