Pattern image correcting apparatus, pattern inspection apparatus, and pattern image correcting method

摘要

The present invention provides an apparatus and method for correcting an inspection reference pattern image in order to properly inspect a pattern image of a specimen. The pattern image correcting apparatus is characterized by including: a first pattern synthesizing unit for synthesizing an assist pattern image and a pattern image to be inspected, thereby generating a pattern image to be inspected with an assist pattern; an assist pattern shift processor; a second pattern synthesizing unit for synthesizing the shifted assist pattern image and the inspection reference pattern image, thereby generating an inspection reference pattern image with an assist pattern; a model generating unit for generating a position shift model by using the pattern image to be inspected with the assist pattern and the inspection reference pattern image with the assist pattern; and a correction pattern image computing unit for correcting the inspection reference pattern image.