摘要 |
The present invention provides metal-containing compounds that include at least one &bgr;-diketiminate ligand, and methods of making and using the same. In certain embodiments, the metal-containing compounds include at least one &bgr;-diketiminate ligand with at least one fluorine-containing organic group as a substituent. In other certain embodiments, the metal-containing compounds include at least one &bgr;-diketiminate ligand with at least one aliphatic group as a substituent selected to have greater degrees of freedom than the corresponding substituent in the &bgr;-diketiminate ligands of certain metal-containing compounds known in the art. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for &bgr;-diketiminate ligands are also provided.
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