| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide technique capable of suppressing outflow of mist and particles and capable of suppressing a flow rate of exhaustion of air for exhaustion from an exhaust port for a liquid processing apparatus that performs liquid processing while rotating a substrate. <P>SOLUTION: The liquid processing apparatus includes: an elevation portion which positions a lower edge of an outer cup at a first height position above a base portion when liquid on the substrate is shaken off by rotating the substrate, and positions the lower edge at a second height position higher than the first height position so as to allow external air to flow in an exhaust space from below the lower edge of the outer cup when the apparatus is in a standby state; and an inclined surface portion which extends inward from the lower edge of the outer cup while tilting downward so as to guide the processing liquid. Mist and particles can be prevented from flowing out of the outer cup from between the outer cup and a base body as air in the exhaust space flows around to the lower edge of the outer cup when a spin chuck is rotating. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
