CIRCUIT PATTERN INSPECTION DEVICE AND INSPECTION METHOD FOR SAME

摘要

Disclosed is a circuit pattern inspection device which provides efficient and highly sensitive monitoring of the frequency and characteristic likelihood of flaws in regions of interest (ROI). The device simultaneously moves a stage continuously and irradiates circuit patterns which are widely spaced in the direction of movement of the stage with a plurality of electron beams disposed in a matrix formation; emitted secondary electrons and the like are acquired; averages images acquired from the same region to acquire a rapid yet high signal-to-noise image; and determines if there are flaws in the circuit pattern from the acquired image. The acquisition of images in a direction vertical to the direction of movement of the stage during movement with spaces between them, instead of adjacent regions, allows efficient monitoring of the frequency and characteristic likelihood of flaws in the ROI only or in the entire circuit pattern.