ALUMINUM OXIDE-ZINC OXIDE SPUTTERING TARGET

摘要

Disclosed is an aluminum oxide-zinc oxide sputtering target characterized by containing at least one of Pb and Cd. The aluminum oxide-zinc oxide sputtering target has a high sintered density even if sintering temperature is low, for example on the order of 1300°C. Consequently, it is not necessary to sinter a starting material powder at a high temperature in order to obtain a high sintered density, and so the burden on the sintering furnace is low, and it is possible to avoid early degradation of the sintering furnace. Also, it is possible to suppress volatilization of zinc and other components from the starting material powder, and it is possible to easily form a film having a planned composition. Additionally, the sputtering target has a low specific resistance. Furthermore, the sputtering target has a low percentage of reduction in sputter rate.