发明名称 FINE RUGGED STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a fine rugged structure and a method for manufacturing the fine rugged structure having at least one of low reflectance and excellent water repellency. SOLUTION: The method for manufacturing the fine rugged structure includes a polymer solution applied film forming process; a waterdrop forming process; a recess forming process; a first protruding structure forming process for sticking a second substrate to a plurality of recesses through an adhesive, stripping the second base to strip at least the surface portions of the plurality of recesses in a thickness direction to thereby form a plurality of first protruding structures on the second substrate; and a second substrate etching process for etching the second substrate with the plurality of first protruding structures as masks. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011173335(A) 申请公布日期 2011.09.08
申请号 JP20100039369 申请日期 2010.02.24
申请人 FUJIFILM CORP 发明人 ITO AKITOSHI;YAMAZAKI HIDEKAZU;SHIMOMURA MASATSUGU;YABU HIROSHI;HIRAI YUJI;ISHIRO KUNIHARU;MATSUO YASUTAKA
分类号 B29C59/00 主分类号 B29C59/00
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