发明名称 |
METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR SINGLE CRYSTAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a nitride semiconductor single crystal which is in a bulk state and has high crystallinity by reducing a recessed portion that is caused during the growth. <P>SOLUTION: The method for producing a nitride semiconductor single crystal by a vapor phase growing method includes steps of: growing a first nitride semiconductor single crystal portion 2 on a seed substrate 1, the single crystal portion 2 having a major face and a recessed portion on the backside of an interface with the seed substrate 1; disposing a mask 4 in the recessed portion; and growing a second nitride semiconductor crystal portion on the first nitride semiconductor portion 2 so as to cover the mask 4. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011173749(A) |
申请公布日期 |
2011.09.08 |
申请号 |
JP20100038281 |
申请日期 |
2010.02.24 |
申请人 |
KYOCERA CORP |
发明人 |
DOMOTO CHIAKI;UENO CHIAKI |
分类号 |
C30B29/38;C23C16/34;C30B25/04;H01L21/205;H01L33/32;H01S5/323 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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