| 发明名称 |
PHOTOSENSITIVE-RESIN REMOVER COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME |
| 摘要 |
A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
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| 申请公布号 |
US2011218134(A1) |
申请公布日期 |
2011.09.08 |
| 申请号 |
US201113039501 |
申请日期 |
2011.03.03 |
| 申请人 |
LEE AHN-HO;LIM JUNGHUN;HONG YOUNG TAEK;KIM HYUNTAK;PARK SEONGHWAN;CHOI BAIKSOON;AHN SEUNGHYUN;LEE BYUNGIL |
发明人 |
LEE AHN-HO;LIM JUNGHUN;HONG YOUNG TAEK;KIM HYUNTAK;PARK SEONGHWAN;CHOI BAIKSOON;AHN SEUNGHYUN;LEE BYUNGIL |
| 分类号 |
G03F7/42 |
主分类号 |
G03F7/42 |
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